Quantitative evaluation of bulk-diffused metal contamination by lifetime techniques

Materials Science and Engineering B

Volumn 55 B55, Issue 1-2, 1998, Pages 21-33

  Polignano, M L ^a   Bellandi, E ^a   Lodi, D ^a   Pipia, F ^a   Sabbadini, A ^a   Zanderigo, F ^a   Queirolo, G ^a   Priolo, F ^b  

^a STMICROELECTRONICS   (Italy)

^b UNIVERSITY OF CATANIA   (Italy)

Author keywords

Bulk diffused; Contaminants; Lifetime techniques

Indexed keywords

ION IMPLANTATION; PHOTOCONDUCTIVITY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING;

METAL CONTAMINANTS; SURFACE PHOTOVOLTAGE;

SILICON WAFERS;

EID: 0348198736     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0921-5107(98)00192-5     Document Type: Article

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