|
Volumn 83, Issue 23, 2003, Pages 4743-4745
|
Low-loss as-grown germanosilicate layers for optical waveguides
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ANNEALING;
COMPOSITION;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
GERMANIUM COMPOUNDS;
GROWTH (MATERIALS);
HIGH TEMPERATURE EFFECTS;
HYDROGEN BONDS;
LIGHT ABSORPTION;
LIGHT POLARIZATION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PRESSURE MEASUREMENT;
PROFILOMETRY;
REFRACTIVE INDEX;
SILANES;
SILICON WAFERS;
SUBSTRATES;
PLANAR WAVEGUIDES;
PRECURSOR GASES;
PROPAGATION LOSSES;
OPTICAL WAVEGUIDES;
|
EID: 0348197100
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1631753 Document Type: Article |
Times cited : (14)
|
References (16)
|