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Physical Review B

Volumn 46, Issue 22, 1992, Pages 14830-14833

Tunneling in all-high-Tc edge junctions with deposited barriers

(8) Laibowitz, R B a Robertazzi, R P a Koch, R H a Kleinsasser, A a Kirtley, J R a Viggiano, J M a Sandstrom, R L a Gallagher, W J a

a IBM RESEARCH (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0348155529 PISSN: 01631829 EISSN: None Source Type: Journal
DOI: 10.1103/PhysRevB.46.14830 Document Type: Article

Times cited : (8)

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