The active dopant concentration in ion implanted indium tin oxide thin films

Journal of Applied Physics

Volumn 80, Issue 7, 1996, Pages 3734-3738

  Vink, T J ^a   Overwijk, M H F ^a   Walrave, W ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0348002662     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363324     Document Type: Article

References (15)

1. J. R. Bellingham, W. A. Phillips, and C. J. Adkins, J. Phys., Condens. Matter 2, 6207 (1990).
2. Y. Shigesato and D. C. Paine, Appl. Phys. Lett. 62, 1268 (1993).
3. G. Frank and H. Köstlin, Appl. Phys. A 27, 197 (1982).
4. Y. Shigesato, D. C. Paine, and T. E. Haynes, J. Appl. Phys. 73, 3805 (1993).
5. L. Gupta, A. Mansingh, and P. K. Srivastava, Thin Solid Films 176, 33 (1989).
6. E. Burstein, Phys. Rev. 93, 632 (1954); T. S. Moss, Proc. Phys. Soc. London, Sect. B 67, 775 (1954).
7. E. Burstein, Phys. Rev. 93, 632 (1954); T. S. Moss, Proc. Phys. Soc. London, Sect. B 67, 775 (1954).
8. I. Hamberg, C. G. Granqvist, K.-F. Berggren, B. E. Sernelius, and L. Engström, Phys. Rev. B 30, 3240 (1984).
9. C. H. L. Weijtens and P. A. C. van Loon, Thin Solid Films 196, 1 (1991).
10. I. Hamberg and C. G. Granqvist, J. Appl. Phys. 60, R123 (1986).
11. Y. Shigesato, D. C. Paine, and T. E. Haynes, Trans. Mater. Res. Soc. Jpn. 17, 503 (1994).
12. T. E. Haynes and Y. Shigesato, J. Appl. Phys. 77, 2572 (1995).
13. Ph. Parent, H. Dexpert, G. Tourillon, and J.-M. Grimal, J. Electrochem. Soc. 139, 276 (1992); ibid. 139, 282 (1992).
14. Ph. Parent, H. Dexpert, G. Tourillon, and J.-M. Grimal, J. Electrochem. Soc. 139, 276 (1992); ibid. 139, 282 (1992).
15. T. E. Haynes (unpublished).