Laser-induced etching of Si surfaces: The effect of weak background light

Journal of Applied Physics

Volumn 79, Issue 8, 1996, Pages 4414-4417

  Grebel, H ^a   Gayen, T ^a   Wu, H W ^a  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347977590     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361749     Document Type: Article

References (9)

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