Physical and magnetic properties of submicron lithographically patterned magnetic islands

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 13, Issue 3, 1995, Pages 1089-1094

  New, R M H ^a   Pease, R F W ^a   White, R L ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COBALT; ELECTRON BEAM LITHOGRAPHY; ETCHING; HYSTERESIS; MAGNETIC FIELDS; MAGNETIC PROPERTIES; MAGNETIZATION; PHYSICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY;

MAGNETIC FORCE MICROSCOPY; MAGNETIC ISLANDS; MAGNETIC PARTICLES; POLYCRYSTALLINE FILMS; SPUTTER ETCHING PROCESS; SUBMICRON LITHOGRAPHY PATTERNING;

MAGNETIC THIN FILMS;

EID: 0347964914     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.587908     Document Type: Article

References (21)