Ab initio 19F NMR chemical shifts calculations for halogenated ethanes and propanes

Journal of Fluorine Chemistry

Volumn 99, Issue 2, 1999, Pages 157-160

  Tanuma, T ^a   Irisawa, J ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

19F NMR chemical shift; Ab initio calculation; Halogenated ethanes; Halogenated propanes

Indexed keywords

EID: 0347802041     PISSN: 00221139     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-1139(99)00125-6     Document Type: Article

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