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Volumn 30, Issue SUPPL. PART 1, 1997, Pages

Plasma etching of silicon carbide using SF 6/O 2 gas mixture and its application to the fabrication of 6H-SiC pn junction diodes

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347783507 PISSN: 03744884 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (3)

References (14)

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