Present status and future prospects of EUV lithography

Journal of Photopolymer Science and Technology

Volumn 10, Issue 3, 1997, Pages 369-376

  Kinoshita, Hiroo ^a   Watanabe, Takeo ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Aspherical; EUVL; Laser plasma; Multilayer; Resist; Synchrotron

Indexed keywords

EID: 0347627911     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.369     Document Type: Article

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