Immunological and Molecular Mechanisms of Photoallergic Contact Dermatitis

Journal of UOEH

Volumn 25, Issue 4, 2003, Pages 387-395

  Tokura, Yoshiki ^a  

^a UNIVERSITY OF OCCUPATIONAL AND ENVIRONMENTAL HEALTH   (Japan)

Author keywords

Contact dermatitis; Contact hypersensitivity; Langerhans cell; Photoallergy; UVA

Indexed keywords

4 AMINOBENZOIC ACID; 4 AMINOBENZOIC ACID GLYCEROL ESTER; AVOBENZONE; BENZOPHENONE; BITHIONOL; BUCLOSAMIDE; CHEMOKINE; CHLORHEXIDINE; CINNAMIC ACID; CYTOKINE; DICHLOROPHEN; FENTICLOR; HEXACHLOROPHENE; IRRITANT AGENT; KETOPROFEN; MAJOR HISTOCOMPATIBILITY ANTIGEN CLASS 2; PADIMATE; SULFANILAMIDE; SUPROFEN; TETRACHLORSALAN; TRICLOCARBAN; TRICLOSAN;

ANTIGEN PRESENTING CELL; ANTIGEN SPECIFICITY; ARTICLE; CONTACT DERMATITIS; DISEASE SEVERITY; EPIDERMIS CELL; HUMAN; IMMUNOLOGY; LANGERHANS CELL; MAJOR HISTOCOMPATIBILITY COMPLEX; OCCUPATIONAL SKIN DISEASE; PHOTOALLERGY; PHOTOCHEMISTRY; PHOTOSENSITIVITY DISORDER; PHOTOTOXICITY; RASH; T LYMPHOCYTE; ULTRAVIOLET A RADIATION; ULTRAVIOLET IRRADIATION;

EID: 0347624079     PISSN: 0387821X     EISSN: None     Source Type: Journal    
DOI: 10.7888/juoeh.25.387     Document Type: Article

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