Dopant diffusion studies and free carrier lifetimes during rapid thermal processing of semiconductors

Materials Science in Semiconductor Processing

Volumn 1, Issue 3-4, 1998, Pages 207-218

  Nagabushnam, Rajan V ^a,c   Singh, Rajiv K ^a   Sharan, Sujit ^b  

^a University of Florida   (United States)

^b MICRON TECHNOLOGY INC   (United States)

^c MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347569924     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(98)00041-9     Document Type: Article

References (31)

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