Coupled simulation of gas flow and heat transfer in an RTF-system with rotating wafer

Materials Science in Semiconductor Processing

Volumn 1, Issue 3-4, 1998, Pages 201-205

  Poscher, S ^a   Theiler, T ^b  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

^b STEAG AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347569923     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(98)00044-4     Document Type: Article

References (5)

1. Spalding B, editor. The Phoenics journal of computational fluid dynamic and its applications, vol. 8, No. 4. Wimbledon, December 1995.
2. Electronic Materials Informations Service: EMIS data-reviews series. Properties of silicon. London: Inspec, 1988.
3. Ludwig JC. Phoenics-2 instruction course notes. CHAM TR300. Wimbledon, 1994.
4. Zhi-min Ling. Silicon oxidation: modeling, characterization and strategic considerations. Ph.D. thesis, Leuven, 1989. p. 181.
5. The national technology road-map for semiconductors. 1997 ed. Austin: SEMATECH, 1997. p. 190.