Rapid thermal magnetic annealing as an emerging technology in field-annealing of thin magnetic films for recording heads

Materials Science in Semiconductor Processing

Volumn 1, Issue 3-4, 1998, Pages 303-315

  Roozeboom, F ^a   Abedrabbo, S ^b   Ravindra, N M ^b   Walk, H ^c   Falter, M ^c  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^c STEAG AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347569917     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(98)00024-9     Document Type: Article

References (26)

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