Using diode laser spectroscopy to evaluate techniques for acceleration of etch chamber evacuation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 1266-1272

  McAndrew, James J F ^a   Inman, Ronald S ^a  

^a AIR LIQUIDE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347563036     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.579939     Document Type: Article

References (23)

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