Fabrication of microstructure using fluorinated polyimide and silicone-based positive photoresist

Microsystem Technologies

Volumn 6, Issue 5, 2000, Pages 165-168

  Ito, T ^a   Sawada, R ^a   Higurashi, E ^a   Kiyokura, T ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347561555     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420000046     Document Type: Article

References (4)

1. Ito T; Sawada R; Higurashi E (1999) Micro IC probe for LSI testing. Proc. IEEE MEMS-99 Int. Conference, Orlando, Florida, USA; pp. 263-266
2. Matsuura T; Yamada N; Nishi S; Hasuda Y (1993) Polyimides Derived from 2,2′-Bis(trifluoromethyl)-4,4′-diamino-biphenyl. 3. Property Control for Polymer Blends and Copolymerization of Fluorinated Polyimides. Macromolecules 26(3): 419-423
3. Sawada R (1995) Integrated Optical Encoder. Transducers '95, Stockholm, Sweden, June 25-29, pp. 281-284
4. Tanaka A; Ban H; Imamura S (1989) Preparation of a Novel Silicone-Based Positive Photoresist and Its Application to an Image Reversal Process. ACS Symposium No. 412 (American Chem. Soc.): 175-188