Mechanism of copper selenide growth on copper-oxide-selenium system

Surface Science

Volumn 548, Issue 1-3, 2004, Pages 276-280

  Ishikawa, Y ^a   Kido, O ^a   Kimura, Y ^a   Kurumada, M ^a   Suzuki, H ^a   Saito, Y ^b   Kaito, C ^a  

^a RITSUMEIKAN UNIVERSITY   (Japan)

^b KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Chalcogens; Clusters; Copper; Diffusion and migration; Electron microscopy

Indexed keywords

ATOMS; COPPER COMPOUNDS; CRYSTAL GROWTH; CRYSTALLIZATION; DEPOSITION; DIFFUSION; ELECTRON BEAMS; ELECTRON DIFFRACTION; EVAPORATION; FILM GROWTH; INTERFACES (MATERIALS); METALLIC FILMS; PARTICLE SIZE ANALYSIS; SELENIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; VOLUME FRACTION;

METAL-DEFICIT LAYERS; SOLID PHASE REACTIONS;

SURFACE REACTIONS;

EID: 0347411217     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2003.11.014     Document Type: Article

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