Optimal control of rapid thermal annealing in a semiconductor process

Journal of Process Control

Volumn 14, Issue 4, 2004, Pages 423-430

  Gunawan, R ^a   Jung, M Y L ^a   Seebauer, E G ^a   Braatz, R D ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Batch control; Microelectronics processes; Optimal control; Rapid thermal annealing; Robustness analysis; Semiconductor processing; Uncertainty analysis

Indexed keywords

CONTROL EQUIPMENT; ELECTRIC RESISTANCE; FEEDBACK CONTROL; MICROELECTRONICS; PARAMETER ESTIMATION; RAPID THERMAL ANNEALING; ROBUSTNESS (CONTROL SYSTEMS); SEMICONDUCTOR JUNCTIONS; TEMPERATURE MEASUREMENT;

QUADRATIC PARAMETERIZATIONS; TRANSIENT ENHANCED DIFFUSION (TED);

OPTIMAL CONTROL SYSTEMS;

EID: 0347379704     PISSN: 09591524     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jprocont.2003.07.005     Document Type: Article

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