Alternative chemistries for chamber cleans to reduce perfluorocompound (PFC) emissions

SSA Journal: Journal of the Semiconductor Safety Association

Volumn 14, Issue 1, 2000, Pages 17-25

  Pauly Hyslop, Nicole M ^a,b,c,d  

^a The University of Texas at Austin   (United States)

^b SONOMA TECHNOLOGY INC   (United States)

^c UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^d UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347368333     PISSN: 1084578X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (14)

1. Wayne, Richard P. Chemistry of Atmospheres, Second Edition. Pp. 40-44. Oxford Science Publications, Oxford, U.K. (1991).
2. Seinfeld, John H., Pandis, Spyros N. Atmospheric Chemistry and Physics: From Air Pollution to Climate Change. John Wiley & Sons, New York (1998).
3. EPA website, http://www.epa.gov/globalwarming/inventory/index.html. (1998).
4. Worth, Walter; Duffin, Bob and Modrey, Laurie. Tool Perfluorocompound (PFC) Emissions Data Report. SEMATECH, Technology Transfer #96073156B-ENG. (1997).
5. Van Zant, Peter. Microchip Fabrication. McGraw Hill. New York, 1990. 2nd ed.
6. 3. http://msds.lib.utexas.edu/n2c?urn:ut lol:msds. mdl.OHS04650. (1999).
7. Gugliemini, Carmen. "Chlorine Trifluoride: Technical Data, Safety, and Handling". Air Products and Chemicals, Inc. Technical Information Center. January (1997).
8. Beu, Laurie; Brown, P.T; Latt, J.; Rapp, J.U.; Gilliland, T.; Tamayo, T.; Harrison, J.; Davison, J.; Cheng, A.; Jewett, J. and Worth, W. Current State of Technology: Perfluorocompound (PFC) Emissions Reduction. International SEMATECH, Technology Transfer #98053508A-TR. June (1998).
9. Mendicino, Laura; Filipiak, S.; Brown, P.T.; Langan, J.; Ridgeway, R.; Johnson, A.; Pearce, R.; Maroulis, P. and Atherton, Alan. "Evaluation of the Applied Materials μClean Technology for DxZ Chamber Clean for Perfluorocompound (PFC) Emissions Reduction." International SEMATECH, Technology Transfer #98082547B-TR. September (1998).
10. 3: supply, vacuum service, and exhaust gas management. Solid State Technology. 40(Sept):107-8 (1997).
11. Saito, Yoji; Yamaoka, Osamu and Yoshida, Akira. Plasmaless cleaning process of silicon surface using chlorine trifluoride. Applied Physics Letters, 56(12): 1119-1121 (1990).
12. Saito, Yoji; Hirabaru, Masahiro and Yoshida, Akira. Plasmaless dry etching of silicon nitride films with chlorine trifluoride gas. IEICE Trans. Electronics. E75-C(7):834-8 (1992).
13. Saito, Yoji; Hirabaru, Masahiro and Yoshida, Akira. Anisotropic and damageless etching of single-crystalline silicon using chlorine trifluoride molecular beams. Journal of Vacuum Science and Technology B. 10(1):175-8(1992).
14. 3) with Metal Alloys. The BOC Group, April (1997).