Atomic scale flattening of organosilane self-assembled monolayer and patterned tin hydroxide thin films

Journal of the European Ceramic Society

Volumn 24, Issue 2, 2004, Pages 427-434

  Shirahata, Naoto ^a   Masuda, Yoshitake ^a   Yonezawa, Tetsu ^a,b   Koumoto, Kunihito ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Films; Functional applications; Organosilane self assembled monolayer; Surfaces

Indexed keywords

DEPOSITION; HYDROGEN; HYDROPHOBICITY; NITROGEN; PHOTOREACTIVITY; SELF ASSEMBLY; SILICA; SILICON; THIN FILMS; TIN COMPOUNDS; ULTRAVIOLET RADIATION;

ATOMIC SCALE FLATTENING; CLEAVAGE;

SILANES;

CERAMICS;

EID: 0347354695     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0955-2219(03)00210-3     Document Type: Article

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