Surface modifications of semiconductor and its photoelectrochemical applications

Chemistry Bulletin / Huaxue Tongbao

Volumn , Issue 9, 1998, Pages 28-31

  Yue, Linhai ^a   Xu, Zhude ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347228954     PISSN: 04413776     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

1. Hong A P, Bahnemann D W, Hoffmann M R. J. Phys. Chem., 1987, 91(8):2109-2117
2. Moser J, Punchiheua S, Infelta P P et al. Langmuir, 1991, 7(12):3012-3018
3. Amy L L, Guangquan Lu, John T Y. Chem. Rev. 1995, 95(3):735-758
4. Copidas K R, Bohorquez M, Kamat P V. J. Phys. Chem., 1990, 94(16):6435-6440
5. Karakitsou K E, Verykios X E. J. Phys. Chem., 1993, 97(6):1184-1189
6. Choi W, Termit A, Hoffmann M R. J. Phys. Chem., 1994, 98(51):l3669-13679
7. Gratzel M, Howe R F. J. Phys. Chem., 1990, 94(6):2566-2572
8. Kamat P V. J. Phys. Chem., 1989, 93(2):859-864
9. O'Regan B, Grātzel M. Nature, 1991, 353(6346):737-739