Fast ICCD imaging of KrF excimer laser induced titanium plasma plumes for silicon metallization

Applied Surface Science

Volumn 138-139, Issue 1-4, 1999, Pages 489-493

  Hong, M H ^a   Lu, Y F ^a   Ho, T M ^a   Lu, L W ^b   Low, T S ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

Author keywords

ICCD imaging; Plasma dynamics; Pulsed laser deposition; Titanium plasma

Indexed keywords

EID: 0347181938     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00444-9     Document Type: Article

References (10)

1. R.K. Singh, J. Narayan, Phy. Rev. B 41 (1990) 8843.
2. T. Venkatesan, X.D. Wu, A. Inam, J.B. Wachtman, Appl. Phys. Lett. 52 (1988) 1193.
3. R.E. Russo, R.P. Reade, J.M. McMillan, B.L. Olsen, J. Appl. Phys. 68 (1990) 1354.
4. D. Fried, T. Kushida, G.P. Reck, E.W. Rothe, J. Appl. Phys. 73 (1993) 7810.
5. S. Proyer, E. Stangl, Appl. Phys. A 60 (1995) 573.
6. D.B. Geohegan, in: D.B. Chrisey, G.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994, p. 115.
7. J.C.S. Kools, T.S. Baller, S.T. De Zwart, J. Dieleman, J. Appl. Phys. 71 (1992) 4547.
8. L.C. Chen, in: D.B. Chrisey, G.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994, p. 167.
9. T.N. Hansen, J. Schou, J.G. Lunney, Appl. Phys. Lett. 72 (1998) 1829.
10. L.W. Lu, Y.F. Lu, M.H. Hong, T.M. Ho, T.S. Low, to be published.