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Volumn 4 4, Issue 294, 1999, Pages 441-450

Mass spectrometric studies of plasmas used for surface treatment

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347172194 PISSN: 12660167 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (1)

References (8)

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- J.A. Rees, D.C. Seymour, C.L. Greenwood and A. Scott - Nucl. Inst. & Methods B, 134, 73 1998
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- Rees, J.A.¹ Seymour, D.C.² Greenwood, C.L.³ Scott, A.⁴

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- Olthoff, J.K.¹ Van Brunt, K.J.² Radovanov, S.B.³ Rees, J.A.⁴ Surowiec, R.⁵

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- H. Kersten, H. Steffen, D. Vender and H.E. Wagner - Vacuum 46, 35, 1995
- (1995) Vacuum , vol.46 , pp. 35
- Kersten, H.¹ Steffen, H.² Vender, D.³ Wagner, H.E.⁴

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- A.J. Beck, L. O'Toole, R.D. Short, A.P. Ameen and F.R. Jones - J Chem Soc. Chem. Comm 1053, 1995
- (1995) J Chem Soc. Chem. Comm , pp. 1053
- Beck, A.J.¹ O'Toole, L.² Short, R.D.³ Ameen, A.P.⁴ Jones, F.R.⁵

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- A.A. Howling, L. Sansonnens, J.L. Dorier and Ch. Hollenstein - J Phys. D., Appl.Phys., 26, 1003, 1993
- (1993) J Phys. D., Appl.Phys. , vol.26 , pp. 1003
- Howling, A.A.¹ Sansonnens, L.² Dorier, J.L.³ Hollenstein, Ch.⁴

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- M. Zeuner, J. Meichsner, and J.A. Rees - J Appl. Phys. 79, 9379, 1996
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- Zeuner, M.¹ Meichsner, J.² Rees, J.A.³

8
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- J.A. Rees, D.C. Seymour, and C L. Greenwood - submitted to Jap. J. Appl. Phys. 1998
- (1998) Jap. J. Appl. Phys.
- Rees, J.A.¹ Seymour, D.C.² Greenwood, C.L.³

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