Analysis of optical character! stics of photoresponsive polymer thin film by highly sensitive optical waveguide polarized detection system

Journal of Photopolymer Science and Technology

Volumn 9, Issue 1, 1996, Pages 79-86

  Sasaki, Kyoichi ^a,b   Nagamura, Tosfflhiiko ^a,b  

^a Graduate School of Electronic Science and Technology

^b SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347156019     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.9.79     Document Type: Article

References (27)

1. T. Nagamura and K. Sakai, J. Chem. Soc. Faraday Trans. J, 84 (1988) 3529.
2. T. Nagamura and S. Muta, J. Photopolym. Sci. Technol., 4 (1991) 55.
3. T. Nagamura and K. Sakai, J. Chem. Soc., Chem. Commun., (1986) 810.
4. T. Nagamura and K. Sakai, Ber. Bunsenges. Phys. Chem., 93 (1989) 1432.
5. T. Nagamura, K. Sakai and T. Ogawa, J. Chem. Soc., Chem. Commum., (1988) 1035.
6. T. Nagamura, K. Sakai and T. Ogawa, Proc. MRS Int. Meeting Adv. Mater., 12 (1989)231.
7. T. Nagamura and K. Sakai, Thin Solid Films, 179 (1989) 375.
8. T. Nagamura, Y. Isoda , K. Sakai and T. Ogawa, J. Chem. Soc., Chem. Commum., (1990) 703.
9. T. Nagamura, Y. Isoda and K. Sakai, J. Chem. Soc., Chem. Commum., (1991) 72.
10. T. Nagamura, Mol. Cryst. Liq. Cryst., 224 (1993) 75.
11. T. Nagamura and Y. Isoda, J. Chem. Soc., Chem. Commum., (1991) 72.
12. T. Nagamura, H. Sakaguchi and K. Suzuki, Bull. Res. Inst. Elec. Shizuoka Univ., 26 (1991)13.
13. T. Nagamura, Polym. Int., 27 (1992) 125.
14. T. Nagamura, S. Muta and K. Sakai, J. Photopolym. Sci. Techno!., 5 (1992) 561.
15. T. Nagamura and K. Sakai, Chem. Phys. Lett., 141 (1987) 553.
16. T. Nagamura and K. Sakai, Ber. Bunsenges. Phys. Chem., 92 (1988) 707.
17. H. Nishida, N. Tanaka, M. Yoshida, T. Sonoda and H. Kobayashi, Bul. Chem. Soc. Jpn., 57 (1984) 2600.
18. T. Nagamura, H. Sakaguchi and S. Muta, Proc. SPIE, 2514 (1995) 241.
19. J. D. Swalen, M. Tacke, R. Santo, K. E. Rieckhoff and J. Fischer, Helv. Chim. Acta, 61 (1978) 960.
20. Z. Ho, W. Wijekoon, E. Koenig, W. Hetherington, III, J. Phys. Chem., 91 (1987) 757.
21. K. Ito and A. Fujishima, J. Am. Chem. Soc., 110 (1988) 6267.
22. K. Ito and A. Fujishima, J. Phys. Chem., 92 (1988) 7043.
23. T. Nagamura, H. Sakaguchi, K. Suzuki, C. Mochizuki and K. Sasaki, J. Photopolym. Sci. Techno!., 6 (1993) 133.
24. T. Nagamura, H. Sakaguchi, K. Sasaki, C. Mochizuki and K. Suzuki, Thin Solid Films, 243 (1994) 660.
25. T. Nagamura, D. Kuroyanagi, K. Sasaki and H. Sakaguchi, Proc. SPIE, 2547 (1995) 320.
26. K. Ogusu, H. Itoh and I. Tanaka, Electron. Commum. J., 66-C (1983) 95.
27. 27. Y. H. Lee, A. Chavez-pirson, S. W. Koch, H. M. Gibbs, S. H. Park, J. Morhange, A. Jeffery and N. Peyghambarian, Phys. Rev. Lett., 57 (1986) 2446.