An epoxide-based photopolymerizable material for stereolithography

Zhurnal Nauchnoi I Prikladnoi Fotografii

Volumn 44, Issue 6, 1999, Pages 11-16

  Dorozhkina, G N ^a   Peredereeva, S I ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347154565     PISSN: 08696144     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

1. Jacobs P.F. Rapid prototyping & manufacturing: fundamentals of Stereolithgraphy. SME, Dearborn, USA, 1992. 434 c.
2. Stowe F.S., Jie Berman R.A // J. Rad. Cyr. 1987. April. P. 16.
3. Bayley W.G. // J. Elastoplastics. 1973. V. 5. P. 142.
4. Crivello J.V., Lam J.H.W. // J. Polym. Sci. 1978. V. 16. P. 2441.
5. Bernhard P., Hoffman M., Schulthess A., Steinmann B. // Chimia. 1994. V. 48. P. 427.
6. Manus P.J.-M. // Conf. Proceed. RADTECH Europe'89. Italy. October 9-11. 1989. P. 2.