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Volumn 352, Issue 1-2, 1999, Pages 6-8

Thermal stability of semiconducting thin germanium/carbon alloy films produced from tetraethylgermanium in an RF glow discharge

Author keywords

Carbon; Germanium; Glow discharge; Organometallic vapour deposition

Indexed keywords


EID: 0347031712     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00374-0     Document Type: Article
Times cited : (9)

References (11)
  • 7
    • 0002868841 scopus 로고
    • Treatment and Etching of Polymers
    • Chapter 3, in: R. d'Agostino (Ed.), Academic Press, New York, Section IV B
    • A.M. Wróbel, M. Wertheimer, Treatment and Etching of Polymers, Chapter 3, in: R. d'Agostino (Ed.), Plasma Deposition, Academic Press, New York, 1990, Section IV B .
    • (1990) Plasma Deposition
    • Wróbel, A.M.1    Wertheimer, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.