Silicon-hydrogen bonds in silicon oxide near the SiO2/Si interface

Applied Surface Science

Volumn 56-58, Issue PART 2, 1992, Pages 836-840

  Ogawa, Hiroki ^a   Terada, Naozumi ^a   Sugiyama, Kazuhisa ^a   Moriki, Kazunori ^a   Miyata, Noriyuki ^b   Aoyama, Takayuki ^b   Sugino, Rinshi ^b   Ito, Takashi ^b   Hattori, Takeo ^a  

^a TOKYO CITY UNIVERSITY   (Japan)

^b FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS--OXIDATION; HYDROGEN PEROXIDE--PH EFFECTS; OXIDES--SPECTROSCOPIC ANALYSIS; SURFACE TREATMENT--PASSIVATION;

ANGLE-RESOLVED PHOTOELECTRON SPECTROSCOPY; HYDROGEN PEROXIDE CLEANING AGENT; INFRARED ABSORPTION SPECTROSCOPY; SEMICONDUCTOR/INSULATOR INTERFACE MONITORING; SILICON DIOXIDE/SILICON INTERFACES; SILICON WAFER CLEANING TECHNIQUES;

SEMICONDUCTING SILICON;

EID: 0347024499     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(92)90347-Z     Document Type: Article

References (3)

1. Silicon-Hydrogen Bonds in Silicon Native Oxides Formed during Wet Chemical Treatments