Effects of supercritical CO2 drying and photoresist strip on low-k films

Materials Research Society Symposium - Proceedings

Volumn 766, Issue , 2003, Pages 303-307

  Reidy, R F ^a   Zhang, Zhengping ^a   Orozco Teran, R A ^a   Gorman, B P ^a   Mueller, D W ^a  

^a UNIVERSITY OF NORTH TEXAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; COMPOSITION EFFECTS; DRYING; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PERMITTIVITY; PHOTORESISTS; POROUS MATERIALS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SUPERCRITICAL FLUIDS; THERMAL EFFECTS;

INTERLAYER DIELECTRIC; POROUS LOW-K FILM; SUPERCRITICAL CARBON DIOXIDE;

DIELECTRIC FILMS;

EID: 0346938380     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-766-e8.20     Document Type: Conference Paper

References (6)

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3. L. Hrubesh and S. R. Buckley, Mat. Res. Soc. Symp. Proc., 476, 99 (1997).
4. L.T. Taylor, Supercritical Fluid Extraction, (John Wiley & Sons, New York, 1996) p. 14.
5. B.P. Gorman, Rosa A. Orozco-Teran, Jodi A. Roepsch, Hanjiang Dong and Richard F. Reidy, Appl. Phys. Lett. 79 4010 (2001)
6. O. S. Heavens, Optical Properties of Thin Solid Films, (Dover Publications, NY, 1991).