Equipment for in situ resistivity and x-ray diffraction studies during ion implantation at temperatures between 4 K and 1270 K

Review of Scientific Instruments

Volumn 67, Issue 11, 1996, Pages 3961-3964

  Koniger A ^a   Hammerl, C ^a   Zander, W ^b   Rauschenbach, B ^a   Stritzker, B ^a  

^a UNIVERSITY OF AUGSBURG   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346905969     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1147299     Document Type: Article

References (17)

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