Physical processes in high-density ablation-controlled capillary plasmas

Physics Letters, Section A: General, Atomic and Solid State Physics

Volumn 258, Issue 4-6, 1999, Pages 335-341

  Kukhlevsky, S V ^a   Kaiser, J ^d   Palladino, L ^b   Reale, A ^b   Tomassetti, G ^b   Flora, F ^c   Giordano, G ^c   Kozma, L ^a   Liska M ^d   Samek, O ^d  

^a UNIVERSITY OF PÉCS   (Hungary)

^b UNIVERSITY OF L'AQUILA   (Italy)

^c ENEA   (Italy)

^d BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

Author keywords

High density ablation controlled capillary plasmas

Indexed keywords

ABLATION; PLASMA DENSITY;

CAPILLARY DISCHARGES; CAPILLARY PLASMA; CONVENTIONAL MODELS; ELECTRODE SURFACES; PHYSICAL PROCESS;

ELECTRIC DISCHARGES;

EID: 0346615787     PISSN: 03759601     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0375-9601(99)00387-4     Document Type: Article

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