A depth profile fitting model for a commercial total reflection X-ray fluorescence spectrometer

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 52, Issue 7, 1997, Pages 823-828

  Mori, Yoshihiro ^a   Uemura, Kenichi ^a   Shimanoe, Kengo ^a  

^a NIPPON STEEL CORPORATION   (Japan)

Author keywords

Depth profiling; Fitting; Surface analysis; Surface contamination; Total Reflection X Ray Fluorescence (TXRF) Spectrometry

Indexed keywords

CONTAMINATION; CURVE FITTING; FLUORESCENCE; MATHEMATICAL MODELS; OPTIMIZATION; PHOTONS; SILICON WAFERS; SURFACE PHENOMENA;

DEPTH PROFILING; SURFACE ANALYSIS; SURFACE CONTAMINATION; TOTAL REFLECTION X RAY FLUORESCENCE SPECTROMETRY (TXRF);

X RAY SPECTROMETERS;

EID: 0346580353     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0584-8547(96)01665-5     Document Type: Article

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