Fabrication of a novel oxygen sensor with CMOS compatible processes

Sensors and Actuators, B: Chemical

Volumn 46, Issue 2-3, 1998, Pages 155-159

  Zhu, Huixian ^a,b   Lo, Tai Chin ^a,e   Lenigk, Ralf ^a,c,d   Renneberg, Reinhard ^a,d,f  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^b XI'AN JIAOTONG UNIVERSITY   (China)

^c UNIVERSITY OF MÜNSTER   (Germany)

^d ICB Institut fur Chemo und Biosensorik GmbH   (Germany)

^e UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^f Institute of Molecular Biology   (Germany)

Author keywords

Oxygen sensor; Ultramicroelectrode array

Indexed keywords

CMOS INTEGRATED CIRCUITS; MICROELECTRODES; PLATINUM; REACTIVE ION ETCHING; SILICA;

ULTRAMICROELECTRODE ARRAYS;

DISSOLVED OXYGEN SENSORS;

EID: 0346546076     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(98)00044-6     Document Type: Article

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