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Volumn 80, Issue 3, 1996, Pages 1437-1445

Quantitative in situ x-ray diffraction analysis of magnetic multilayers during annealing

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0346513960     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363011     Document Type: Article
Times cited : (8)

References (37)
  • 26
    • 85033810584 scopus 로고    scopus 로고
    • R. Kuzel, Computer Program, Fac. Math., Charles University, Prague, Czech Republic
    • R. Kuzel, Computer Program, Fac. Math., Charles University, Prague, Czech Republic.
  • 28
    • 85033805627 scopus 로고    scopus 로고
    • note
    • We used only seven structural parameters and we avoided using the asymmetrical strain profiles at interfaces.
  • 31
    • 85033805525 scopus 로고    scopus 로고
    • The measured FWHM of a Ω scan is narrower
    • The measured FWHM of a Ω scan is narrower.
  • 32
    • 85033817770 scopus 로고    scopus 로고
    • PC-PDF 2.12 database JCPDS
    • PC-PDF 2.12 database JCPDS.
  • 33
    • 85033820872 scopus 로고    scopus 로고
    • note
    • For example, Co/Cu, Ag/NiFe, Nb/Cu; in semiconductor or x-ray mirrors applications, the lateral coherence length ξ is typically much more longer (≈5000 Å).
  • 35
    • 85033821895 scopus 로고    scopus 로고
    • note
    • NiFe would not bring this effect. See the parameter definition above Eq. (1).
  • 36
    • 85033807975 scopus 로고    scopus 로고
    • Contrary to proposed modest migration (Ref. 17) of Ag from the NiFeAg layer
    • Contrary to proposed modest migration (Ref. 17) of Ag from the NiFeAg layer.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.