Formation and growth of fractal patterns in high energy P+ -implanted silicon and N + Zn-implanted SiO2/GaAsP during thermal annealing

Science in China, Series E: Technological Sciences

Volumn 40, Issue 4, 1997, Pages 343-349

  Wu, Yuguang ^a   Zhang, Tonghe ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

Fractal patterns; P+ high energy implantation into silicon; TEM observation; Thermal annealing; Zn + n implantation into gaasp

Indexed keywords

EID: 0346477475     PISSN: 10069321     EISSN: None     Source Type: Journal    
DOI: 10.1007/bf02919419     Document Type: Article

References (12)

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