Experimental studies of N+ implantation into CVD diamond thin films

Science in China, Series E: Technological Sciences

Volumn 40, Issue 4, 1997, Pages 361-368

  Xin, Huoping ^a   Lin, Chenglu ^a   Wang, Jianxin ^a   Zou, Shichang ^a   Shi, Xiaohong ^b   Lin, Zixin ^a   Zhou, Zuyao ^a   Liu, Zugang ^c  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b SHANGHAI INSTITUTE OF TECHNICAL PHYSICS   (China)

^c SHANGHAI UNIVERSITY   (China)

Author keywords

Carbon nitride; C n covalent bond; Electrically inactive deep level impurity; N+ implantation into diamond films; Raman spectroscopy; Ultraviolet photoluminescence spectroscopy (UV PL); X ray photoelectron spectroscopy (XPS)

Indexed keywords

EID: 0346477470     PISSN: 10069321     EISSN: None     Source Type: Journal    
DOI: 10.1007/bf02919421     Document Type: Article

References (14)

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