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EPJ Applied Physics

Volumn 25, Issue 1, 2004, Pages 25-31

Evidence of strain induced structural change in hetero-epitaxial NdNiO 3 thin films with metal-insulator transition

(6) Laffez, P a Lebedev, O I b Ruello, P a Desfeux, R c Banerjee, G d Capon, F a

a UNIVERSITÉ DU MAINE (France)

b UNIVERSITY OF ANTWERP (Belgium)

c UNIVERSITÉ D'ARTOIS (France)

d SAHA INSTITUTE OF NUCLEAR PHYSICS (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CERAMIC MATERIALS; ELECTRON TRANSPORT PROPERTIES; EPITAXIAL GROWTH; MAGNETRON SPUTTERING; METAL INSULATOR TRANSITION; MORPHOLOGY; NEODYMIUM COMPOUNDS; STRAIN; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRONIC TRANSPORT; OXYGEN PRESSURE;

THIN FILMS;

EID: 0346397910 PISSN: 12860042 EISSN: None Source Type: Journal
DOI: 10.1051/epjap:2003087 Document Type: Article

Times cited : (12)

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