Local removal of thick anodic oxide film on aluminum with a photon rupture technique and local metal deposition

Electrochemistry

Volumn 71, Issue 11, 2003, Pages 920-926

  Sakairi, Masatoshi ^a   Kato, Zenta ^a   Chu, Song Zhu ^b   Takahashi, Hideaki ^a   Abe, Yoshihiko ^c   Katayama, Naoki ^c  

^a HOKKAIDO UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c HOKKAIDO INDUSTRIAL RESEARCH INSTITUTE   (Japan)

Author keywords

Aluminum; Anodic oxide film; Laser ablation; Local metal deposition

Indexed keywords

CRACKS; DEPOSITION; DYEING; ELECTROCHEMISTRY; ELECTROPLATING; IRRADIATION; LASER ABLATION; LASER BEAMS; NEODYMIUM LASERS; PHOTONS; PULSED LASER APPLICATIONS; THICK FILMS;

LOCAL METAL DEPOSITION; PHOTON RUPTURE TECHNIQUE; THICK ANODIC OXIDE FILM;

ALUMINUM;

EID: 0346396464     PISSN: 13443542     EISSN: None     Source Type: Journal    
DOI: 10.5796/electrochemistry.71.920     Document Type: Article

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