Acid Formation and Deprotection Reaction by Novel Sulfonates in a Chemical Amplification Positive Photoresist

Chemistry of Materials

Volumn 2, Issue 3, 1990, Pages 299-305

  Schlegel, L ^a   Ueno, T ^a   Shiraishi, H ^a   Hayashi, N ^a   Iwayanagi, T ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346367232     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm00009a021     Document Type: Article

References (16)

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