Moisture diffusion along the TiN/SiO2 interface and in plasma-enhanced chemical vapor deposited SiO2

Journal of Applied Physics

Volumn 88, Issue 6, 2000, Pages 3695-3698

  Xu, G ^a   Clarke, D R ^a   Ma, Q ^b   Fujimoto, H ^b  

^a University of California   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346346534     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1289481     Document Type: Article

References (8)

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