Compensation of cross talk in the optical lever deflection method used in atomic force microscopy

Review of Scientific Instruments

Volumn 74, Issue 12, 2003, Pages 5115-5117

  Fujisawa, Satoru ^a   Ogiso, Hisato ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DATA REDUCTION; IRRADIATION; LIGHT INTERFERENCE; LIGHT REFLECTION; OPTICAL SENSORS; PHOTODETECTORS; PHOTODIODES; PROJECTION SYSTEMS; SENSITIVITY ANALYSIS;

DISPLACEMENT; OPTICAL LEVER DEFLECTION METHOD;

CROSSTALK;

EID: 0346306096     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1622972     Document Type: Article

References (4)

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3. L. Howald, H. Rudin, and H.-J. Guntherodt, Rev. Sci. Instrum. 63, 3909 (1992).
4. S. Fujisawa and H. Ogiso, US Patent No. 6,407,806 B2.