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Volumn 10, Issue 4, 2003, Pages 411-424

Highly hydrophobic sisal chemithermomechanical pulp (CTMP) paper by fluorotrimethylsilane plasma treatment

Author keywords

CTMP; Hydrophobic paper; Plasma modification; Pulp modification; Surface fluorination

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION IMPLANTATION; LIGNIN; SCANNING ELECTRON MICROSCOPY;

EID: 0346152774     PISSN: 09690239     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1027381810022     Document Type: Article
Times cited : (62)

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    • Fonseca J.L.C., Tasker S., Apperley D.C. and Badyal J.P.S. 1996. Plasma-enhanced chemical vapor deposition of organosilicon materials: a comparison of hexamethyldisilane and tetramethylsilane precursors. Macromolecules 29: 1705-1710.
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    • France R.M. and Short R.D. 1998. Plasma treatment of polymers: the effects of energy transfer from an argon plasma on the surface chemistry of polystyrene, and polypropylene. A high-energy resolution of X-ray photoelectron spectroscopy study. Langmuir 14: 4827-4835.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.