Helium effusion measurements for studying the microstructure of a-SiC:H films deposited by d.c. sputtering

Diamond and Related Materials

Volumn 12, Issue 10-11, 2003, Pages 1927-1931

  Saleh, R ^a   Munisa, L ^a   Beyer, W ^b  

^a UNIVERSITY OF INDONESIA   (Indonesia)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Amorphous alloys; Implantation; SiC; Sputtering

Indexed keywords

DEPOSITION; MICROSTRUCTURE; PRECIPITATION (CHEMICAL); SILICON ALLOYS; SPUTTERING;

EFFUSION;

HELIUM;

ION IMPLANTATION;

EID: 0346118781     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(03)00207-3     Document Type: Article

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