Surface modification of silica particles with organoalkoxysilanes through two-step (acid-base) process in aqueous solution

Journal of Ceramic Processing Research

Volumn 3, Issue 3 PART 2, 2002, Pages 216-221

  Jeon, Byung Jun ^a   Hah, Hoe Jin ^a   Koo, Sang Man ^a  

^a Hanyang University   (South Korea)

Author keywords

Organoalkoxysilanes; Silica; Surface modification; Two step process

Indexed keywords

EID: 0346044630     PISSN: 12299162     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

1. W. Stöber, A. Fink, and E. Bohn, J. Colloid Interface Sci. 26 (1968) 62-69.
2. G.H. Bogush, M.A. Tracy, and C.F. Zukoski IV, J. Non-Cryst. Solids 104 (1988) 95-106.
3. C.J. Brinker and G.W. Scherer, in "Sol-Gel Science", (Academic Press, New York, 1990) p. 108.
4. K. Bridger, D. Fairhurst, and B. Vincent, J. Colloid Interface Sci. 68 (1991) 190-195.
5. J.Y. Choi, C.H. Kim, and D.K. Kim, J. Am. Ceram. Soc. 81[5] (1998) 1184-1188.
6. C.J. Brinker and G.W. Scherer, in "Sol-Gel Science", (Academic Press, New York, 1990) p. 141.
7. B.K. Coltrain, S.M. Melpolder, and J.M. Salva, in Proceedings of the IVth Int'l. Conference on Ultrastructure Processing of Ceramics, Glasses, and Composites, Tucson, AZ, eds, D.R. Uhlmann and D.R. Ulrich (Wiley, New York, 1989) Feb. p. 19.