Photopolymerization by evanescent waves: Characterization of photopolymerizable formulation for photolithography with nanometric resolution

Applied Surface Science

Volumn 138-139, Issue 1-4, 1999, Pages 87-92

  Espanet, Anne ^a   Dos Santos, Georges ^a   Ecoffet, Carole ^a   Lougnot, Daniel J ^a  

^a UNIVERSITÉ DE HAUTE ALSACE   (France)

Author keywords

Evanescent waves; Microparts fabrication; Photolithography; Photopolymers; Thin films

Indexed keywords

EID: 0345921776     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00388-2     Document Type: Article

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