Effects of Impurities on Dielectric Properties and Plasma Resistance of Al2O3 Ceramics for Application of Microwave Window

Key Engineering Materials

Volumn 161-163, Issue , 1999, Pages 513-516

  Terao, K ^a  

^a Sumitomo Metals Technology Ltd   (Japan)

Author keywords

Al2O3; Microwave; Plasma; Q Factor; Window

Indexed keywords

EID: 0345916113     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: None     Document Type: Article

References (6)

1. R. Heidinger and F. Koniger, J. Nucl. Mater., 155-157, 344(1988).
2. J. Molla, A. Ibarra, H.M. Frost, III, F.W. Clinard, Jr., J.C. Kennedy, III and M. Jimenez de Castro, J. Nucl. Mater., 179-181, 375(1991).
3. Y.H. Lee, Z.H. Zhou, D.A. Danner, P.M. Fryer and J.M. Harper, J. Appl. Phys., 68, 5329(1990).
4. A.C. Miller, F.P. McCluskey and J.A. Taylar, J. Vac. Sci. Technol., A9, 1461(1991).
5. W.G.M. van den Hoek, Mat. Res. Soc. Symp. Proc., 68, 71(1986).
6. B.W. Hakki and P.D. Coleman, IRE Trans. Microwave Theory Tech., MTT-8, 402(1960).