Dry and wet etching of ScAlMgO4

Solid-State Electronics

Volumn 42, Issue 3, 1998, Pages 467-469

  Brandle, C D ^a   Ren, F ^a   Lee, J W ^b   Pearton, S J ^b  

^a LUCENT TECHNOLOGIES   (United States)

^b UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; HYDROCHLORIC ACID; HYDROFLUORIC ACID; HYDROGEN; METHANE; NITRIC ACID; NITRIDES; PLASMA ETCHING; REACTIVE ION ETCHING; SCANDIUM COMPOUNDS; SEMICONDUCTING GALLIUM COMPOUNDS; SUBSTRATES;

SCANDIUM ALUMINUM MAGNESIUM OXIDE; WET ETCHING;

SEMICONDUCTING ALUMINUM COMPOUNDS;

EID: 0345913590     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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