Determination of Trace Anions in High-Purity Gases in Semiconductor Processes

Journal of Chromatographic Science

Volumn 36, Issue 12, 1998, Pages 579-582

  Ruimei, Wen ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0345828191     PISSN: 00219665     EISSN: None     Source Type: Journal    
DOI: 10.1093/chromsci/36.12.579     Document Type: Article

References (6)

1. W. Ruimei and W. Zaizhong. Technology of Manufacturing and Determination for Ultrapure Water. Science Press, Beijing, China, 1997, pp 282-84 (in Chinese).
2. J. Burnett. World class contamination control practices. Semiconductor Int. 11(5): 160-63 (1988).
3. P.A. McConnelee, S.T. Poirier, and R. Hanselka. Water quality improvements and VLSI defect density. Semiconductor Int. 9(8): 82-85 (1986).
4. K.M. Kearney. Ultrapure water requirements squeeze into the submicron range. Semiconductor Int. 12(1): 80-85 (1989).
5. E. Dabek-Zlotorzynska and J.F. Dlouhy. Automatic simultaneous determination of anions and cations in atmospheric aerosols by ion chromatography. J. Chromatogr. 640: 217-26 (1993).
6. W.T. Frankenberger, Jr., H.C. Mehra, and D.T. Gjerde. Environmental application of ion chromatography. J. Chromatogr. 504: 211-45 (1990).