Synthesis of a photosensitive poly(arylene ether) containing pendant benzoyl groups

Journal of Macromolecular Science - Pure and Applied Chemistry

Volumn 34, Issue 6, 1997, Pages 929-939

  Konno, Keiji ^a   Ueda, Mitsuru ^a   Cassidy, Patrick E ^b   Fitch, John W ^b  

^a YAMAGATA UNIVERSITY   (Japan)

^b Texas State University San Marcos   (United States)

Author keywords

Nucleophilic substitution; Pendant benzoyl groups; Photosensitive polymer; Photosensitivity; Poly(arylene ether); Positive type resist

Indexed keywords

EID: 0345727211     PISSN: 10601325     EISSN: None     Source Type: Journal    
DOI: 10.1080/10601329708015001     Document Type: Article

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