Correlation between hardness and embedded argon content of magnetron sputtered chromium films

Thin Solid Films

Volumn 347, Issue 1-2, 1999, Pages 46-55

  Paturaud, C ^a   Farges, G ^a   Sainte Catherine, M C ^a   Machet, J ^b  

^a Centre Technique d'Arcueil   (France)

^b UNIVERSITY OF LIMOGES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHROMIUM; CRYSTAL MICROSTRUCTURE; DENSITY (SPECIFIC GRAVITY); ELECTRIC POTENTIAL; MAGNETRON SPUTTERING; MICROHARDNESS; STEEL; SUBSTRATES; TEMPERATURE; VICKERS HARDNESS TESTING;

CHROMIUM FILMS; DEPOSITION RATE; SUBSTRATE BIAS; SUBSTRATE TEMPERATURE; TARGET POWER DENSITY; VICKERS MICROINDENTATION;

THIN FILMS;

EID: 0345633666     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01417-5     Document Type: Article

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