Dispersion and tunneling analysis of the interfacial gate resistance in schottky barriers

Physical Review B - Condensed Matter and Materials Physics

Volumn 59, Issue 20, 1999, Pages 13102-13113

  Rohdin, H ^a   Moll, N ^a   Bratkovsky, A M ^a   Su, C Y ^a  

^a HEWLETT PACKARD LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0345473356     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.59.13102     Document Type: Article

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