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Journal of Applied Physics
Volumn 74, Issue 9, 1993, Pages 5402-5405
Physical damage in silicon formed by helicon wave plasma etching
(5)
Tsukada, Tsutomu
a
Nogami, Hiroshi
a
Hayashi, Jun
b
Kawaguchi, Kazu
b
Hara, Tohru
b
a
Canon ANELVA Technix Corporation
(
Japan
)
b
HOSEI UNIVERSITY
(
Japan
)
Author keywords
[No Author keywords available]
Indexed keywords
EID
:
0345471526
PISSN
:
00218979
EISSN
:
None
Source Type
:
Journal
DOI
:
10.1063/1.354245
Document Type
:
Article
Times cited : (
7
)
References (
17
)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.
